www.impedans.com

Publications

Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode

D. Gahan B. Dolinaj, and M. B. Hopkins, Rev. Sci. Instrum. 79, 033502 (2008)

http://link.aip.org/link/?RSINAK/79/033502/1

Comparison of Plasma Parameters determined with a Langmuir Probe and with a retarding field energy analyzer

D Gahan et al 2008 Plasma Sources Sci. Technol. 17, 035026 (9pp)

http://www.iop.org/EJ/abstract/0963-0252/17/3/035026/

Retarding Field Analyzer for Ion Energy Distribution Measurement Through a Radio-Frequency or Pulsed Biased Sheath

D. Gahan, B. Dolinaj, C Hayden, MB Hopkins, Journal, Plasma Processes and Polymers (2008)

http://www3.interscience.wiley.com/journal/122458016/abstract

Electrical Characterization of a capacitive rf plasma sheath

D Gahan, MB Hopkins, Review of Scientific Instruments Volume 78 016102 (2007)

http://link.aip.org/link/?RSINAK/78/016102/1

Effect of dc bias control on the power absorption in low-pressure, radio-frequency capacitive sheaths

D Gahan et al, J. Appl. Phys. 101, 023303 (2007)

http://link.aip.org/link/?JAPIAU/101/023303/1

Collisionless electron power absorption in capacitive radio-frequency plasma sheaths

D Gahan, MB Hopkins, J. Appl. Phys. 100, 043304 (2006)

http://link.aip.org/link/?JAPIAU/100/043304/1

Enhanced volume production of negative ions in the post discharge of a multicusp hydrogen discharge

M. B. Hopkins et al J. Appl. Phys. 70, 2009 (1991);

http://link.aip.org/link/?JAPIAU/70/2009/1

Spatially dependent photodetachment measurements in a low-pressure high-power modulated volume ion source

M. B. Hopkins J. Phys. D: Appl. Phys. 28 473-478

http://www.iop.org/EJ/abstract/0022-3727/28/3/005

Time-resolved electron energy distribution function measurements in a pulsed magnetic multipole hydrogen discharge

M.B. Hopkins J. Appl. Phys. 69, 3461 (1991)

http://link.aip.org/link/?JAPIAU/69/3461/1

Langmuir probe technique for plasma parameter measurement in a medium density discharge

MB Hopkins et al, Rev. Sci. Instrum. 57, 2210 (1986)

http://link.aip.org/link/?RSINAK/57/2210/1

Citations

CHF3 dual-frequency capacitively coupled plasma

Hu J, Xu YJ, Ye C    ACTA PHYSICA SINICA   Volume: 59   Issue: 4   Pages: 2661-2665   Published: APR 2010

http://wulixb.iphy.ac.cn/cn/ch/common/view_abstract.aspx?file_no=w20100476&flag=1

Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometrical transparency and collisional effects

Baloniak T, Reuter R, Flotgen C, et al.  JOURNAL OF PHYSICS D-APPLIED PHYSICS   Volume: 43   Issue: 5 Article Number: 055203 Published: FEB 10 2010

http://iopscience.iop.org/0022-3727/43/5/055203

The effect of low frequency pulse-shaped substrate bias on the remote plasma deposition of a-Si : H thin films

Martin IT, Wank MA, Blauw MA, et al. PLASMA SOURCES SCIENCE & TECHNOLOGY   Volume: 19   Issue: 1 Article Number: 015012   Published: FEB 2010

http://iopscience.iop.org/0963-0252/19/1/015012

Hard graphite-like hydrogenated amorphous carbon grown at high rates by a remote plasma

Singh SV, Zaharia T, Creatore M, et al. JOURNAL OF APPLIED PHYSICS   Volume: 107   Issue: 1 Article Number: 013305   Published: JAN 1 2010

http://jap.aip.org/japiau/v107/i1/p013305_s1?isAuthorized=no

High density mode in xenon produced by a Helicon Double Layer Thruster

Author(s): West MD, Charles C, Boswell RW JOURNAL OF PHYSICS D-APPLIED PHYSICS   Volume: 42   Issue: 24 Article Number: 245201   Published: DEC 21 2009

http://iopscience.iop.org/0022-3727/42/24/245201

Accurate control of ion bombardment in remote plasmas using pulse-shaped biasing

Author(s): Kudlacek P, Rumphorst RF, van de Sanden MCM JOURNAL OF APPLIED PHYSICS   Volume: 106   Issue: 7 Article Number: 073303   Published: OCT 1 2009

http://jap.aip.org/japiau/v106/i7/p073303_s1

Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films

Author(s): Corbella C, Rubio-Roy M, Bertran E, et al. JOURNAL OF APPLIED PHYSICS   Volume: 106   Issue: 3 Article Number: 033302   Published: AUG 1 2009

http://jap.aip.org/japiau/v106/i3/p033302_s1