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OVERVIEW  SPECIFICATIONS  PULSED RF  DEMO

Octiv Pulse RF

The pulsed excitation of low pressure rf discharges is used to obtain greater control over plasma behaviour by controlling the pulse period and duty cycle. Improvements in etch and deposition processes are obtained by choosing appropriate pulsed repetition frequencies. 

The Octiv Pulsed RF VI Probe facilitates analysis of the instantaneous impedance and other plasma parameters over a pulse period in a pulsed RF plasma system. The probe is mounted post-match to deliver key electrical measurements with a time resolution of 1uS!

Features and Benefits

• Acquire data for fundamental and harmonics of voltage, current, phase and impedance in a pulsed RF plasma
• Acquire data over an entire period or a window within the period
• Operates in burst mode or modulation modes
• Pulsed RF Mode works on a standard Octiv VI Probe, no additional hardware required
• 1uS resolution to provide high-resolution measurements in real-time
• Pulsed RF mode uses level triggering - no external synchronisation required on standard model
• In-line signal level monitor to assist with trigger level detection
• Integrated API for process control applications

Specifications

The following Pulsed RF specifications apply in addition to the standard Octiv VI Probe specifications:

Please contact us to discuss your specific requirements.

OVERVIEW  SPECIFICATIONS  PULSED RF  DEMO