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Pulsed Plasma Diagnostics Workshop 2012

1st Announcement

PULSED PLASMA DIAGNOSTICS WORKSHOP

6TH - 7TH SEPTEMBER 2012 in Dublin, Ireland

FIRST ANNOUNCEMENT

Scope and purpose of this event

Pulsed plasma discharges are used for a variety of applications in modern industry. Magnetron sputtering and HiPIMS discharges, used for depositing layers, generally use pulsed direct current (pDC) excitation of the target and/or substrate to generate the plasma and control the layer properties. Operating frequencies range from 100's Hz to 100's kHz, typically. Recently, there has been a move towards pulsed radio-frequency (pRF) discharge operation by the etching community where the rf driving frequency is pulsed in the 10’s kHz range. In these devices (inductively coupled (ICP) reactors, for example) the source and/or bias frequency are pulsed independently or synchronously to provide better control over the ion energy and etch properties. There are many other examples and uses of pulsed plasmas in the wider community also. The purpose of this workshop is to gather a team of leading experts from the various pulsed plasma fields to share their knowledge and expertise in the art of pulsed plasma diagnostics. This will provide a unique opportunity for plasma physicists from different fields to interact and learn about diagnostic techniques that may now be applicable to their own research. 

Keynote speakers

The workshop lectures will be presented by invited speakers who are world leading experts in their respective fields. Invited speakers include:

Uwe Czarnetski (Ruhr-University Bochum)
Vitezslav Stranak (University of Greifswald)
Richard van de Sanden (FOM Institute for Plasma Physics Rijnhuizen)
Carles Corbella (Ruhr-University Bochum)
Jakob Barz (IGVT – University of Stuttgart)
Gilles Cunge (LTM/CNRS Grenoble)
Mike Hopkins (Impedans Ltd)
Arutiun Ehiasarian (Sheffield Hallam University)
Ralf Bandorf (Fraunhofer Institute)