Semion ™Process Ion Energy and
Ion Flux Analysis System The Semion™ Retarding Field Energy Analyzer System is designed to measure both the Ion Flux and Ion Energy on a biased surface in a plasma chamber. The RFEA Probe can be mounted on an electrode/substrate holder, or in a dummy wafer to sample wafer processing conditions. The Semion™ System is suitable for installation on a wide range of plasma source configurations; capacitively coupled, inductively coupled, magnetron, cascaded arc, and remote source. Semion™ can be used under the following bias conditions (single-, dual-, and multi-frequency) - Grounded
 - DC
- Floating
- RF
- Pulsed/shape
Download Semion Product Overview A unique feature of the product is the ability to place the RFEA probe on an RF biased surface. The RFEA probe floats with the electrode, similar to a wafer, and can measure the ion flux and ion energy at the surface. The Semion™ System comprises a Retarding Field Energy Analyzer (RFEA) multi-grid Probe, chamber feed-through assembly, electronic control unit, and application software. The Semion™ Control Unit (SCU) provides all of the required grid voltage biases and comes with software to sweep and control the RFEA Probe automatically.  
Features & Benefits- Substrate mounted Retarding Field Energy Analyzer Probe
- In-situ real-time measurement of
- Ion Energy Distribution
- Ion Flux
- Ion Current
- Electron Flux and Energy
- Measurement of Energies in range of 800eV at pressures up to 300mT
- Time resolved measurement capability up to 500kHz for pulsed systems, with time step resolution of 44nS
- Plasma floating potential measurement adjustment feature
- Easy to install, no retrofit required
- Portable system allowing analysis in multiple chambers using single system
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Semion Ion Energy Analyzer