 Semion ™
Process Ion Energy and
Ion Flux Analysis System The Semion™ Retarding Field Energy Analyzer System is designed to measure both the Ion Flux and Ion Energy on a biased surface in a plasma chamber. The RFEA Probe can be mounted on an electrode/substrate holder, or in a dummy wafer to sample wafer processing conditions. The Semion™ System is suitable for installation on a wide range of plasma source configurations; capacitively coupled, inductively coupled, magnetron, cascaded arc, and remote source. Semion™ can be used under the following bias conditions (single-, dual-, and multi-frequency) - Grounded
- DC
- Floating
- RF
- Pulsed/shape
A unique feature of the product is the ability to place the RFEA probe on an RF biased surface. The RFEA probe floats with the electrode, similar to a wafer, and can measure the ion flux and ion energy at the surface. The Semion™ System comprises a Retarding Field Energy Analyzer (RFEA) multi-grid Probe, chamber feed-through assembly, electronic control unit, and application software. The Semion™ Control Unit (SCU) provides all of the required grid voltage biases and comes with software to sweep and control the RFEA Probe automatically.
Features & Benefits- Substrate mounted Retarding Field Energy Analyzer Probe
- In-situ measurement of
- Ion Energy Distribution
- Ion Flux
- Ion Current
- Electron Flux and Energy
- Measurement of Energies in range of 500eV at pressures up to 300mT
- Time resolved measurement capability up to 500kHz for pulsed systems, with time step resolution of 44nS
- Plasma floating potential measurement adjustment feature
- Easy to install, no retrofit required
- Portable system allowing analysis in multiple chambers using single system
InstallationThe RFEA is compact and does not require modification of the electrode during installation. The sensor sits on the electrode surface in place of a substrate. Sensor cables are fed through the chamber side port via a feed-through assembly. Electrical connections are carried to the Semion™ acquisition system from the chamber flange connections. Customized substrate holders can be supplied to support installation in all types of chambers.  
Semion RFEA Installation RFEA Probe mounted on electrode ApplicationsThe Semion™ System finds many applications in research and industry. Beam quality can be monitored in sputtering systems, and bimodal ion energy distributions may be observed in RF biased systems. Time resolved measurements for pulsed DC applications are possible by synchronising the Semion™ acquisition system with the source generator.  
Current-voltage characteristics at various Ion energy distributions calculated from discharge pressures for a grounded electrode the current-voltage characteristics  
IED’s with 2 MHz RF bias at various potentials IED’S for various bias frequencies with fixed potential
Discharge pressure = 2mTorr
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Semion Ion Energy Analyzer