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Understanding Plasma Etching: The key to Next-Gen Semiconductor Devices

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Optimization of plasma polymerization process with the Impedans Octiv VI probe for polymer film depositions

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Mastering Precision: End Point Detection in Semiconductor Manufacturing

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Understanding Plasma Thruster Dynamics and Thrust Assessment Using Impedans Semion RFEA

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Identifying ALE window in plasma etching of SiO2 and Si3N4 with Impedans Octiv VI probe.

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Unveiling Plasma Harmonics: The Fingerprint of Semiconductor Manufacturing

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Impedans Semion provides key ion energy measurements required for the development of Vertical Graphene through PECVD process

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AI’s Vision – VI Probes Shaping the Future of Semiconductor Manufacturing

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Impedans Langmuir probe used in the optimization of thin film deposition process employing microwave assisted reactive HiPIMS.

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Advancing Precision – VI Probes Illuminating Semiconductor Manufacturing

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A note from our CEO Dr. David Gahan

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Ion beam assisted chemical vapor deposition of hybrid coating – Process diagnostics and mechanisms