Categories Application Notes Applications Impedans Octiv VI Probe used for Etch Rate Uniformity Measurements for a Photoresist Etch Post author By nadia lobo Post date August 28, 2024
Categories Blog Post Why Timing Matters: Time-Resolved Plasma Diagnostics with Langmuir Probe Post author By nadia lobo Post date August 26, 2024
Categories Blog Post Radio Frequency Power: Driving Modern Plasma Technologies Post author By nadia lobo Post date July 30, 2024
Categories Application Notes Applications Octiv VI probe application for surface wettability control and fluorination of amorphous carbon films Post author By nadia lobo Post date July 16, 2024
Categories Blog Post Unlocking Advanced Manufacturing: Plasma-Assisted Deposition Process Post author By nadia lobo Post date June 27, 2024
Categories Application Notes Applications Impedans Langmuir Probe used for the etching process of magnetic tunnel junction materials in random access memory devices Post author By nadia lobo Post date June 19, 2024
Categories Blog Post Understanding Plasma Etching: The key to Next-Gen Semiconductor Devices Post author By nadia lobo Post date May 24, 2024
Categories Application Notes Applications Optimization of plasma polymerization process with the Impedans Octiv VI probe for polymer film depositions Post author By nadia lobo Post date May 15, 2024
Categories Blog Post Mastering Precision: End Point Detection in Semiconductor Manufacturing Post author By nadia lobo Post date April 19, 2024
Categories Application Notes Applications Understanding Plasma Thruster Dynamics and Thrust Assessment Using Impedans Semion RFEA Post author By nadia lobo Post date April 9, 2024
Categories Application Notes Applications Identifying ALE window in plasma etching of SiO2 and Si3N4 with Impedans Octiv VI probe. Post author By nadia lobo Post date March 29, 2024
Categories Blog Post Unveiling Plasma Harmonics: The Fingerprint of Semiconductor Manufacturing Post author By nadia lobo Post date March 25, 2024
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