Categories Blog Post Navigating the Angstrom Age – Crafting Precision in Semiconductor Manufacturing Post author By nadia lobo Post date November 24, 2023
Categories Application Notes Applications HiPIMS induced high-purity Ti3AlC2 MAX phase coating at low-temperature of 700 ◦C Post author By nadia lobo Post date November 15, 2023
Categories Application Notes Applications Plasma Characteristics of a Novel Coaxial Laser-Plasma Hybrid Welding of Ti Alloy Post author By nadia lobo Post date November 2, 2023
Categories Application Notes Applications Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process Post author By nadia lobo Post date November 2, 2023
Categories Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers Post author By nadia lobo Post date November 1, 2023
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