Categories Wiki Parameters Affecting Materials Post author By Sean Mulcahy Post date December 15, 2022
Categories Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4 Study of SiO2 sputter etch rate in RF-Biased ICP discharge. Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Fundamental Research Langmuir Probe Tool Characterization Analysis of 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Process Performance Semion 2500 V4 Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
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