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Application Notes Applications

Optimization of plasma polymerization process with the Impedans Octiv VI probe for polymer film depositions

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Application Notes Applications

Understanding Plasma Thruster Dynamics and Thrust Assessment Using Impedans Semion RFEA

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Application Notes Applications

Identifying ALE window in plasma etching of SiO2 and Si3N4 with Impedans Octiv VI probe.

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Application Notes Applications

Impedans Semion provides key ion energy measurements required for the development of Vertical Graphene through PECVD process

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Application Notes Applications

Impedans Langmuir probe used in the optimization of thin film deposition process employing microwave assisted reactive HiPIMS.

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Application Notes Applications

Ion beam assisted chemical vapor deposition of hybrid coating – Process diagnostics and mechanisms

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Application Notes Applications

Measuring Ion Energy Distributions by Retarding Field Energy Analyzer and Using Low-Energy Ions for Si-ALE by Cl2

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Application Notes Applications

HiPIMS induced high-purity Ti3AlC2 MAX phase coating at low-temperature of 700 ◦C

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Application Notes Applications

Plasma Characteristics of a Novel Coaxial Laser-Plasma Hybrid Welding of Ti Alloy

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Application Notes Applications

Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process

Categories
Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

Categories
Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

RF Matching Network Characterization