Categories Application Notes Applications HiPIMS induced high-purity Ti3AlC2 MAX phase coating at low-temperature of 700 ◦C Post author By nadia lobo Post date November 15, 2023
Categories Application Notes Applications Plasma Characteristics of a Novel Coaxial Laser-Plasma Hybrid Welding of Ti Alloy Post author By nadia lobo Post date November 2, 2023
Categories Application Notes Applications Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process Post author By nadia lobo Post date November 2, 2023
Categories Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers Post author By nadia lobo Post date November 1, 2023
Categories Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization RF Matching Network Characterization Post author By Sean Mulcahy Post date March 6, 2023
Categories Application Notes RF Match unit Characterization Matchbox Characterization Post author By Sean Mulcahy Post date December 15, 2022
Categories Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4 Study of SiO2 sputter etch rate in RF-Biased ICP discharge. Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Fundamental Research Langmuir Probe Tool Characterization Analysis of 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Fundamental Research Langmuir Probe Langmuir probe used in a lunar dust application to measure the electron density and energy distribution Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC Ion energy distribution measurements in RF and pulsed DC plasma discharges Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
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