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Application Notes Blog

Study of SiO2 sputter etch rate in RF-Biased ICP discharge.

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Application Notes

Analysis of 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas

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Application Notes Blog

Langmuir probe used in a lunar dust application to measure the electron density and energy distribution

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Application Notes Blog

Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

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Application Notes

Plasma diagnostics of low-pressure high-power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

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Application Notes Blog

Ion energy distribution measurements in RF and pulsed DC plasma discharges

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Application Notes Blog

Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.

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Application Notes Blog

Investigation of the performances of the microwave plasma source ‘Aura-wave’ by Impedans Langmuir Probe System

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Application Notes Blog

In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer

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Application Notes Blog

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

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Application Notes

Design and characterization of a plasma chamber for improved radial and axial film uniformity using Impedans’ Langmuir probe system

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Application Notes Blog

Inductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe