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Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4

Study of SiO2 sputter etch rate in RF-Biased ICP discharge.

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Application Notes Model Validation Octiv Suite 2.0

An experimental and analytical study of an asymmetric capacitively coupled plasma used for plasma polymerization using Impedans’ Octiv Suite 2.0 VI probe

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Application Notes Model Validation Semion 2500 V4

Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system

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Application Notes Fundamental Research Langmuir Probe Model Validation

Numerical and Experimental Diagnostics of Dusty Plasma in a Coaxial Gridded Hollow Cathode Discharge

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Application Notes Fundamental Research Langmuir Probe Model Validation

Study of EEPF characteristics of an expanding inductively coupled hydrogen plasma