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Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4

Impedans’ Semion and Langmuir Probe systems used to study the SiO2 sputter etch rate in RF-Biased ICP discharge

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Application Notes Model Validation Octiv Suite 2.0

Measurement of DC self bias and Ion flux using Impedans Octiv VI probe during plasma polymerization process in an asymmetric capacitively coupled plasma

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Application Notes Model Validation Semion 2500 V4

Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system

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Application Notes Fundamental Research Langmuir Probe Model Validation

Impedans Langmuir Probe used for electron density measurements in dusty plasma produced by Coaxial Gridded Hollow Cathode Discharge

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Application Notes Fundamental Research Langmuir Probe Model Validation

Impedans’ Langmuir Probe used to study the EEPF characteristics of an expanding inductively coupled hydrogen plasma.