Categories Application Notes Blog Post Langmuir Probe Model Validation Process Performance Semion 2500 V4 Study of SiO2 sputter etch rate in RF-Biased ICP discharge. Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4 Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Blog Post Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC Ion energy distribution measurements in RF and pulsed DC plasma discharges Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4 Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Octiv Suite 2.0 Process Performance Semion 2500 V4 Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4 The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Vertex Ion angular distribution measurement with a planar retarding field analyzer Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4 Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Ion velocity distribution measurement through high-aspect ratio holes using the Semion system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Vertex Ion energy and ion flux measurements through high-aspect ratio holes using the Vertex system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Quantum Measurement of deposition rates and ion energy distributions using the Quantum System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4 Tool Characterization Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA Post author By Sean Mulcahy Post date October 5, 2022
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