Categories Application Notes Blog Post Langmuir Probe Model Validation Process Performance Semion 2500 V4Study of SiO2 sputter etch rate in RF-Biased ICP discharge. Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Blog Post Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDCIon energy distribution measurements in RF and pulsed DC plasma discharges Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Octiv Suite 2.0 Process Performance Semion 2500 V4Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance VertexIon angular distribution measurement with a planar retarding field analyzer Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process PerformanceIon velocity distribution measurement through high-aspect ratio holes using the Semion system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance VertexIon energy and ion flux measurements through high-aspect ratio holes using the Vertex system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance QuantumMeasurement of deposition rates and ion energy distributions using the Quantum System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4 Tool CharacterizationCharacterization of SiO2 pattern transfer in an ALE process using the Semion RFEA Post author By Sean Mulcahy Post date October 5, 2022
info@impedans.com 
ImpedansImpedansImpedans