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Application Notes Blog Post Langmuir Probe Model Validation Process Performance Semion 2500 V4

Study of SiO2 sputter etch rate in RF-Biased ICP discharge.

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Application Notes Blog Post Process Performance Semion 2500 V4

Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

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Application Notes Blog Post Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC

Ion energy distribution measurements in RF and pulsed DC plasma discharges

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Application Notes Blog Post Process Performance Semion 2500 V4

Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.

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Application Notes Blog Post Octiv Suite 2.0 Process Performance Semion 2500 V4

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

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Application Notes Blog Post Process Performance Semion 2500 V4

The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System

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Application Notes Process Performance Vertex

Ion angular distribution measurement with a planar retarding field analyzer

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Application Notes Blog Post Process Performance Semion 2500 V4

Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis

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Application Notes Blog Post Process Performance

Ion velocity distribution measurement through high-aspect ratio holes using the Semion system

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Application Notes Blog Post Process Performance Vertex

Ion energy and ion flux measurements through high-aspect ratio holes using the Vertex system

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Application Notes Blog Post Process Performance Quantum

Measurement of deposition rates and ion energy distributions using the Quantum System

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Application Notes Blog Post Process Performance Semion 2500 V4 Tool Characterization

Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA