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Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

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Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

RF Matching Network Characterization

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Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4

Study of SiO2 sputter etch rate in RF-Biased ICP discharge.

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Application Notes Fundamental Research Langmuir Probe Tool Characterization

Analysis of 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas

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Application Notes Fundamental Research Langmuir Probe

Langmuir probe used in a lunar dust application to measure the electron density and energy distribution

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Application Notes Process Performance Semion 2500 V4

Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

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Application Notes Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC

Ion energy distribution measurements in RF and pulsed DC plasma discharges

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Application Notes Process Performance Semion 2500 V4

Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.

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Application Notes Langmuir Probe Tool Characterization

Investigation of the performances of the microwave plasma source ‘Aura-wave’ by Impedans Langmuir Probe System

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Application Notes Semion 2500 V4 Tool Characterization

In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer

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Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

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Application Notes Langmuir Probe Tool Characterization

Design and characterization of a plasma chamber for improved radial and axial film uniformity using Impedans’ Langmuir probe system