Categories
Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

Categories
Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

Utilizing Impedans Octiv VI Probes for Characterization of RF Matching Networks

Categories
Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4

Impedans’ Semion and Langmuir Probe systems used to study the SiO2 sputter etch rate in RF-Biased ICP discharge

Categories
Application Notes Fundamental Research Langmuir Probe Tool Characterization

Impedans Langmuir Probe used to analyse 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas

Categories
Application Notes Fundamental Research Langmuir Probe

Langmuir probe used in a lunar dust application to measure the electron density and energy distribution

Categories
Application Notes Process Performance Semion 2500 V4

Semion retarding field energy analyzer used to investigate reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Categories
Application Notes Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC

Semion RFEA used for Ion energy distribution measurements in RF and pulsed DC plasma discharges

Categories
Application Notes Process Performance Semion 2500 V4

Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.

Categories
Application Notes Langmuir Probe Tool Characterization

Investigation of the performances of the microwave plasma source ‘Aura-wave’ by Impedans Langmuir Probe System

Categories
Application Notes Semion 2500 V4 Tool Characterization

In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer

Categories
Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

Categories
Application Notes Langmuir Probe Tool Characterization

Application of Impedans Langmuir Probe for uniformity measurement in RF plasma source