Categories
Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

Categories
Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

RF Matching Network Characterization

Categories
Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

Inductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe