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Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Bias potential measurement with Octiv VI probe during atomic layer etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

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Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

Utilizing Impedans Octiv VI Probes for Characterization of RF Matching Networks

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Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

Measurements of plasma produced by Inductively coupled array (INCA) with Impedans’ Langmuir Probe, Semion RFEA System and Octiv VI Probe

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Application Notes Fundamental Research Langmuir Probe Octiv Poly 2.0 Tool Characterization

Application of Impedans Langmuir Probe and Octiv Poly in ICP argon discharge to study electron kinetics and spatial transport

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Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection

Application of the Impedans Moduli RF Spectrometer for Detecting Clean and Small Open Area Etch Endpoints through RF Harmonic Emission from Plasma

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Application Notes Octiv Poly 2.0

Impedans Octiv VI Probe used to study the relation between ion flux and deposition rate of organophosphate thin films in plasma

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Application Notes Octiv Poly 2.0 virtual metrology

Octiv VI probe used to measure the RF characteristics of a commercial CCP reactor

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Application Notes Octiv Poly 2.0 Tool Characterization

Electrical characterization of a RF powered micro atmospheric pressure plasma jet using Octiv VI probe

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Application Notes Langmuir Probe Octiv Poly 2.0 virtual metrology

Correlation between plasma parameters and Impedans Octiv VI probe measurements using Regression Analysis