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Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

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Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

RF Matching Network Characterization

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Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

Inductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe

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Application Notes Fundamental Research Langmuir Probe Octiv Poly 2.0 Tool Characterization

Impedans Langmuir Probe and Octiv Poly are used to study the nonlocal electron kinetics and spatial transport in radio-frequency two-chamber inductively coupled argon discharges

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Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection

Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection

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Application Notes Octiv Poly 2.0

Investigation of the deposition rate of organophosphate thin films using Octiv VI Probe.

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Application Notes Octiv Poly 2.0 virtual metrology

Octiv VI probe used to measure the RF characteristics of a commercial CCP reactor

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Application Notes Octiv Poly 2.0 Tool Characterization

Study demonstrating a simple radio-frequency (RF) power-coupling scheme for a micro atmospheric pressure plasma jet

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Application Notes Langmuir Probe Octiv Poly 2.0 virtual metrology

Correlation between plasma parameters and Impedans Octiv VI probe measurements using Regression Analysis