Categories Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit CharacterizationRF Matching Network Characterization Post author By Sean Mulcahy Post date March 6, 2023
Categories Application Notes Blog Post Octiv Suite 2.0 Process Performance Semion 2500 V4Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool CharacterizationInductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Model Validation Octiv Suite 2.0An experimental and analytical study of an asymmetric capacitively coupled plasma used for plasma polymerization using Impedans’ Octiv Suite 2.0 VI probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Fundamental Research Octiv Suite 2.0 Semion 2500 V4 Tool CharacterizationThe magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Fundamental Research Langmuir Probe Octiv Suite 2.0Impedans Langmuir Probe and Octiv Suite are used to study the time dependencies of pulsed inductively coupled Ar and Ar/CF4 discharges Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point DetectionUsing Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Octiv Suite 2.0Continuous-Wave RF Plasma Polymerisation of Furfuryl Methacrylate (FMA) Post author By Sean Mulcahy Post date October 5, 2022
Categories Application Notes Blog Post Octiv Suite 2.0Ion flux as an alternative deposition rate parameter Post author By Sean Mulcahy Post date October 5, 2022
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