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Application Notes Applications Fundamental Research Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Process Performance

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

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Application Notes Applications Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 RF Match unit Characterization

RF Matching Network Characterization

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Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

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Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

Inductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe

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Application Notes Model Validation Octiv Suite 2.0

An experimental and analytical study of an asymmetric capacitively coupled plasma used for plasma polymerization using Impedans’ Octiv Suite 2.0 VI probe

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Application Notes Fundamental Research Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

The magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system

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Application Notes Fundamental Research Langmuir Probe Octiv Suite 2.0

Impedans Langmuir Probe and Octiv Suite are used to study the time dependencies of pulsed inductively coupled Ar and Ar/CF4 discharges

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Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection

Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection

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Application Notes Octiv Suite 2.0

Continuous-Wave RF Plasma Polymerisation of Furfuryl Methacrylate (FMA)

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Application Notes Octiv Suite 2.0

Ion flux as an alternative deposition rate parameter