Categories Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4 Impedans’ Semion and Langmuir Probe systems used to study the SiO2 sputter etch rate in RF-Biased ICP discharge Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Process Performance Semion 2500 V4 Semion retarding field energy analyzer used to investigate reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC Semion RFEA used for Ion energy distribution measurements in RF and pulsed DC plasma discharges Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Semion 2500 V4 Tool Characterization In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4 Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization Measurements of plasma produced by Inductively coupled array (INCA) with Impedans’ Langmuir Probe, Semion RFEA System and Octiv VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Semion 2500 V4 Tailored ion energy distribution measurements at an rf-biased plasma electrode using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Fundamental Research Octiv Suite 2.0 Semion 2500 V4 Tool Characterization The magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Process Performance Semion 2500 V4 Ion flux and energy measurement using Impedans Semion system in silicon etching with a pulsed HBr/O2 plasma. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Model Validation Semion 2500 V4 Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
info@impedans.com 
ImpedansImpedansImpedans
