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Application Notes Langmuir Probe Model Validation Process Performance Semion 2500 V4

Study of SiO2 sputter etch rate in RF-Biased ICP discharge.

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Application Notes Process Performance Semion 2500 V4

Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

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Application Notes Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDC

Ion energy distribution measurements in RF and pulsed DC plasma discharges

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Application Notes Process Performance Semion 2500 V4

Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.

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Application Notes Semion 2500 V4 Tool Characterization

In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer

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Application Notes Octiv Suite 2.0 Process Performance Semion 2500 V4

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

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Application Notes Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

Inductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe

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Application Notes Fundamental Research Semion 2500 V4

Tailored ion energy distributions at an rf-biased plasma electrode using Impedans’ Semion RFEA System

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Application Notes Fundamental Research Octiv Suite 2.0 Semion 2500 V4 Tool Characterization

The magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system

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Application Notes Process Performance Semion 2500 V4

The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System

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Application Notes Process Performance Semion 2500 V4

Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis

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Application Notes Model Validation Semion 2500 V4

Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system