Categories Application Notes Blog Post Langmuir Probe Model Validation Process Performance Semion 2500 V4Study of SiO2 sputter etch rate in RF-Biased ICP discharge. Post author By Sean Mulcahy Post date December 2, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Blog Post Langmuir Probe Process Performance Semion 2500 V4 Semion 3KV Semion pDCIon energy distribution measurements in RF and pulsed DC plasma discharges Post author By Riyazul Mohamed Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge. Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Semion 2500 V4 Tool CharacterizationIn-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Octiv Suite 2.0 Process Performance Semion 2500 V4Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Octiv Mono 2.0 Octiv Poly 2.0 Octiv Suite 2.0 Semion 2500 V4 Tool CharacterizationInductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Fundamental Research Semion 2500 V4Tailored ion energy distributions at an rf-biased plasma electrode using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Fundamental Research Octiv Suite 2.0 Semion 2500 V4 Tool CharacterizationThe magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Process Performance Semion 2500 V4Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis Post author By Sean Mulcahy Post date October 20, 2022
Categories Application Notes Blog Post Model Validation Semion 2500 V4Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system Post author By Sean Mulcahy Post date October 20, 2022
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