Langmuir Spatial Probe Applications

The Langmuir Spatial Probe used in Dusty Plasma applications

Langmuir Probe used in an RF Dusty Plasma to measure the dust charge and density

Abstract

It is reported that 50 per cent of the failure in semiconductor production is due to dust particle contamination in plasma processes such as plasma etching. This study aimed to develop a method for measuring the density and charges of dust particles in a capacitive coupled cylinder discharge chamber in mixtures of gases SiH4 / C2H4 / Ar. A Langmuir probe was employed to gain such parameters as electron density and ion density of the dusty plasma.

LP02: Langmuir Probe used in an RF Dusty Plasma to measure the dust charge and density


The Langmuir Spatial Probe used in Plasma Etching applications

End-point detection of polymer etching using Langmuir Probes

Abstract

Determining accurately the end point of a plasma-etching process is extremely important for integrated circuit fabrication, as overetching can result in the removal of part of the film, or substrate lying under the film to be etched, and/or in extra undercut of the film. End-point detection is traditionally performed using several different techniques including the four most common techniques: measurement of the DC self-bias voltage, mass spectrometry, emission spectrometry, and interferometry.

LP03: End-point detection of polymer etching using Langmuir Probes

Langmuir Probe used in experimental and numerical investigations of the phase-shift effect in capacitively coupled discharges

Abstract

In this study, the authors have used a Langmuir Probe to measure the electron density and the electron energy distribution function in phase-shift controlled capacitively coupled plasmas. To verify the experimental results, a 2D fluid model was also used to calculate the electron densities at various phase differences.

LP10: Langmuir Probe used in experimental and numerical investigations of the phase-shift effect in capacitively coupled plasma discharges


The Langmuir Spatial Probe used in HiPIMS Plasma applications

Plasma diagnostics of low-pressure high-power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Abstract

The study focused on the plasma measurement of parameters to explore the assistance of the electron cyclotron wave resonance (ECWR) on the evolution of HiPIMS discharge, where it has several benefits.

SE04/LP08: Plasma diagnostics of low pressure HiPIMS assisted by ECWR plasma

Langmuir Single Probe used in determining the temporal evolution of negative ion density in the afterglow of reactive HiPIMS of titanium in an argon/oxygen gas mixture

Abstract

This study used a Langmuir Single Probe to determine the temporal evolution of the oxygen negative ion and electron densities during the offtime of a reactive HiPIMS discharge operating in argon–oxygen gas mixtures. The aim of the study was to add to the knowledge base information about oxygen negative ion dynamics that will help many plasma processing methods.

LP09: Langmuir Single Probe used in determining the temporal evolution of negative ion density in the afterglow of reactive HiPIMS of titanium in an argon/oxygen gas mixture

The Langmuir Spatial Probe used in PECVD applications

A study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopy

Abstract

Plasma-assisted processes are widely used in various areas of modern manufacturing, including physical vapour deposited (PVD) hard coatings, and there is an ongoing need for characterisation of plasma parameters. Beside the conventional Langmuir probe technique, plasma spectroscopy is being more and more widely used. This paper compares the results obtained by the Langmuir plasma probe with the results of energy and mass resolved plasma spectroscopy during three modes of operation (heating, etching, deposition) in a commercial triode ion plating system (Blazers BAI 730 M) used to deposit hard coatings like TiN, CrN and Ti(C,N).

LP06: A study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopy


The Langmuir Spatial Probe used in Space Plasma applications

Langmuir probe used in a lunar dust application to measure the electron density and energy distribution

Abstract

The single Langmuir probe is ideal for measuring and understanding the nature of the photoelectron plasma environment above a VUV illuminated surface. It is this photoelectron plasma region that provides the local environment for dust particles in a lunar environment.

LP01: Langmuir probe used in a lunar dust application to measure the electron density and energy distribution

Hall Effect Thruster plasma plume characterization with probe measurements and self-similar fluid models

Abstract

Hall effect thrusters (HET) are currently recognized as a good propulsion means for long missions and moves that require large velocity increments. The plasma plume of a HET exhibits a relatively large divergence angle of about 45°, and investigating this plume and its expansion into space is vital for understanding these devices and assessing the mechanical and electrical interactions of the exhaust plasma plume with the spacecraft itself and the surrounding environment.

LP04: Hall Effect Thruster plasma plume characterization with probe measurements and self-similar fluid models


The Langmuir Spatial Probe used in Plasma Sputtering applications

Observation of two-temperature electrons in a sputtering magnetron plasma

Abstract

Understanding electron transport in sputtering magnetrons is essential for the understanding of the operation of these devices, which are used for sputter etching and thin-film deposition. Several recent experiments have used Langmuir probes to investigate the electron component of a magnetron plasma and mechanisms of electron transport. For instance, Rossnagel and Kaufman reported that the electron temperature and density decrease with distance from the cathode, and noted the presence of a high-temperature electron tail under certain conditions, such as in a He discharge.

LP05: Observation of two-temperature electrons in a sputtering magnetron plasma

Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering using a Langmuir probe

Abstract

With the knowledge that no investigation of certain key parameters of the plasma during Modulated Pulse Power Magnetron Sputtering (MPPMS) has yet been published, in this study, the authors employed a Langmuir probe to measure temporally resolved electron density, ion density, electron temperature, floating potential and plasma potential during the process.

LP07: Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering using a Langmuir probe