Substrate Level Measurement

Vertex RFEA System

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Vertex RFEA System

The Vertex Retarding Field Energy Analyser (RFEA) system measures the Ion flux and Ion energy distribution function (IEDF) incident on a surface in real time using an imitation substrate with replaceable, integrated sensors. The Vertex Multi sensor system can have up to 13 sensing elements distributed around the imitation substrate, primarily to investigate the uniformity of the ion energy and ion flux at the substrate in industrial plasma applications. The Vertex system can also measure these parameters for a range of configurable Aspect Ratios (ARs) ranging from 0.5 to 20, with a resolution of 0.5, to understand their influence on deep trench etching. A variety of replaceable sensing elements are available with different sensitivities for compatibility with a wide range of plasma densities and discharge pressures.

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Key Features

Measure the Ion Flux and Ion Energy Distribution with energy range up to 2000eV (process dependant).

Aspect Ratio scans ranging from 0.5 to 20. Suitable for Grounded, Floating and RF Biased conditions

Up to 13 sensors integrated into a single holder allowing uniformity measurements

Holders with different geometries available upon request

Fully automated software analysis including IEDF adjustment for sensor DC bias potential

Replaceable sensor elements with different sensitivities ranging from 0.001 Am-2 to 700 Am-2.

Sensor elements and holder available in anodised aluminium, bare aluminium or stainless-steel options.

Key Benefits

Portable system allowing analysis in multiple chambers using a single sensor.

Provides in-situ measurement of Ion Energy Distribution (IED) under plasma processing conditions.

Automatically generates contour maps of energy and flux uniformity over the wafer area.

Provides insight for fundamental research and for plasma model validation.

Generates process data for customer escalations or product marketing.

Correlates process performance with the key plasma process drivers (Ion Energy and Ion Flux).

Electronics Box
Feed-Through
Button Probes
Holder

Electronics Box

The Vertex Retarding Field Energy Analyser (RFEA), electronics box is calibrated accurately for voltages ranging from -2000V to +2000V and currents ranging from 100 pA to 60 mA.

Model Types	Length	Description
02-0459-01	Semion Electronics Unit

Feed-Through

The vacuum feed-through transmits electrical signals by connecting the Electronics box from outside the vacuum chamber to the Semion sensor inside the vacuum chamber.

Model Number	Product Name	Description
05-0456-01	Semion Multi Feedthrough	Flange Type CF40 (custom available)
02-0545-01	Semion Multi Time Resolved Feedthrough	Flange Type CF40 (custom available)

Button Probes

The Button probes of the sensor are designed to be disposable. Once the measurements start to drift, one can simply replace the sensor and continue measurements.

Model Type	Button Type	Description
02-0007-03	Low Density
02-0333-01	Standard Density
02-0336-01	High Density

Holder

The main purpose of the sensor holder is to hold the replaceable Button Probe sensors. It can withstand temperatures up to 150<sup>o</sup>C without the need for cooling.

Model Number	Product Name	Description
02-0390-01	50 mm Single Holder	Single holders available from 50 mm to 450 mm
02-0399-01	70 mm Single Holder
02-0423-01	150 mm Multi Holder
02-0435-01	200 mm Multi Holder
02-0447-01	300 mm Multi Holder
02-0450-01	450 mm Multi holder

RFEA Probe Specifications

Number of sensors (Button Probes)

1 to 13 ( depending on holder)

Probe configuration

4-grid

Button Probe diameter (sensing element)

33mm

Holder diameter

50 - 450 mm diameter options (custom avilable)

Holder thickness

5mm

Max. operating temperature

150°C

Button Probe material

Aluminium, anodised aluminium, stainless steel

Holder material

Aluminium, anodised aluminium, stainless steel

RFEA Probe cable length

650 mm (custom available)

Flange Type

CF40 as standard, KF40 and custom options available

Vertex System Specifications

Aspect Ratio Range

0.5 to 20

Aspect Ratio Resolution

0.5

Ion Energy Range

2000 eV (Low/Standard/High Density Button Probe)
150 eV (High Pressure Button Probe)

Ion Flux

0.001 to 3 Am-2 (Low Density Button Probe)
0.01 to 50 Am-2 (Standard Density Button Probe)
0.1 to 700 Am-2 (High Density Button Probe)

Pressure Range
Pressure Range

≤ 300 mTorr (Low/Standard/High Density Button Probe)
≤ 1.5 Torr (High Pressure Button Probe)

IEDF Resolution

±1 eV nominal

Ion Desity Range

10¹² to 10¹⁸ m^-3 (Button Probe dependent)

Max. RF Bias Voltage (applied to probe)

1 kV**(peak to peak)

Max. DC Bias Voltage

-1940 V

Bias Frequency Range

100 kHz to 80 MHz

Sync Frequency Range (Time Resolved)*

4 Hz to 100 kHz

Time Resolved Method*

Boxcar intergration

Time Resolved*

100 µs

* For Pulsed Plasmas with Vertex sensor mounted on a grounded electrode. Aspect Ratio scan not available in time resolved mode.

** @ 13.56 MHz. Reduces to 0.3 kV @ 60 MHz