Effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge
Magnetron Sputtering has become the process of choice for the deposition of a wide range of industrially significant coatings. However, the effect of excitation frequency, especially at different working gas pressures has seldom been reported.
This Appnote highlights one such publication characterising a VHF Magnetron Sputtering system operated at multiple frequencies and influence of gas pressure/ discharge voltages on IEDF profiles using the Impedans Semion RFEA System.
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