Substrate Ion Interactions

Request a quote or further specificationsInteractions of ions at a substrate play a major role in plasma processing. The ability to quantify the flux and energy of ions impacting a surface is crucial for optimising process conditions.

Related Products

Semion Single Sensor | Retarding Field Energy Analyser

The Semion Single Sensor is placed at any location inside a plasma reactor and measures the energy of ions hitting a surface using a single measurement sensor.

Plasma Parameters Measured:
Ion Energy • Ion Flux • Negative Ions • Bias Voltage (Vdc)

Semion Multi Sensor | Retarding Field Energy Analyser

Semion Multi Sensor

The Semion Multi-Sensor measures the uniformity of ion energies hitting a surface using a number of plasma measurement sensors.

Plasma Parameters Measured:
Ion Energy Uniformity • Ion Flux Uniformity • Negative Ion Uniformity • Bias Voltage (Vdc)

Vertex Single Sensor | Ion Energy Distribution

The Vertex Single Sensor is placed at any location inside a plasma reactor and measures the ion energy distribution as a function of aspect ratio, hitting a surface using a single sensor.

Plasma Parameters Measured:
Ion Energy as a Function of Aspect Ratio • Ion Energy • Ion Flux • Negative Ions • Bias Voltage (Vdc)

Vertex Multi Sensor | Ion Energy Distribution

The Vertex Multi-Sensor measures the ion energy distribution as a function of aspect ratio, hitting a surface inside a plasma reactor from multiple locations to analyse ion angle uniformity.

Plasma Parameters Measured:
Ion Energy as a Function of Aspect Ratio • Ion Energy Uniformity • Ion Flux Uniformity • Negative Ion Uniformity • Bias Voltage (Vdc)

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