The Alfven is designed to detect arcing in RF plasmas with 1 microsecond resolution.

The Langmuir Spatial can map out the ion density with 1 mm resolution across your plasma chamber, rapidly mapping uniformity under different process conditions

The Octiv Mono can be used to characterize the power efficiency and impedance range of match boxes.

The Quantum RFEA is a hybrid between an ion energy analyzer and quartz crystal microbalance, enabling it to directly measure the ion/neutral ratio impacting a substrate surface. This is one of the key parameters for transferring thin film processes between different tools.

Plasma assisted Thin Film Deposition techniques can be categorized in three groups, namely, Sputtering, Plasma Enhanced Chemical Vapor Deposition (PECVD) and Atomic Layer Deposition (ALD).

Process of cleaning or removing material from a substrate surface utilizing a plasma process. he most widely used variants of plasma etching technology are: Reactive Ion Etching, Inductively Coupled Plasma Etching and Atomic Layer Etching (ALE).

Plasma thrusters fall into the category of electric thrusters, and use electric or magnetic fields to accelerate the propellant. A variety of designs to generate and accelerate the plasma can be grouped broadly into Hall thruster, RF (Helicon) thruster and microwave (ECR) thruster.

Radio frequency (RF) generators are key components in semiconductor manufacturing units. The measurements about impedance, phase, current and voltages waveform etc. enable process efficiency and repeatability.

Atmospheric pressure plasmas are used for a wide variety of applications. A major advantage of atmospheric plasmas is that no vacuum equipment is required to create low pressure environments.

The plasma generation environment depends on application requirements and pressure ranges. The fundamental properties of a plasma span a wide range of particle temperatures and densities depending on the source used.

Synthesis of novel materials such as transparent conducting oxides (TCOs) and diamond like coatings (DLCs) is the key project of any fabrication lab in today’s semiconductor industry.