Impedans Clear Room
Measure the

Impossible

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Silicon Wafer

Substrate-level Measurement

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Langmuir Probe

Bulk Plasma Measurement

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advanced RF calibration laboratory

LAB RFx

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OUR PRODUCTS
Substrate Level Measurement

Measure the ion energies and ion flux impacting on your substrate with our RFEAs - rapidly characterize your plasma chamber under different power, pressure, frequency and gas flow conditions.

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RF Voltage-Current Probes

Our high performance Octiv VI probe can measure RF power with 1% accuracy, as well as measure impedance and RF harmonics to get a direct view of your plasma.

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Bulk Plasma Measurements

Measure the fundamental plasma parameters such as the ion density, electron temperature and plasma potential with our state-of-the-art Langmuir Probes

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Service and support Impedans
Software & Resources

Download the latest software or review our research publications using these plasma measurement instruments

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APPLICATIONS

Arc Detection

The Alfven is designed to detect arcing in RF plasmas with 1 microsecond resolution.

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Plasma Uniformity Measurement

The Langmuir Spatial can map out the ion density with 1 mm resolution across your plasma chamber, rapidly mapping uniformity under different process conditions

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Matchbox Characterization

The Octiv Mono can be used to characterize the power efficiency and impedance range of match boxes.

RF Matching Network Characterization

Thin Film Process Transfer

The Quantum RFEA is a hybrid between an ion energy analyzer and quartz crystal microbalance, enabling it to directly measure the ion/neutral ratio impacting a substrate surface. This is one of the key parameters for transferring thin film processes between different tools.

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Thin Film Deposition

Plasma assisted Thin Film Deposition techniques can be categorized in three groups, namely, Sputtering, Plasma Enhanced Chemical Vapor Deposition (PECVD) and Atomic Layer Deposition (ALD).

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Plasma Etching

Process of cleaning or removing material from a substrate surface utilizing a plasma process. he most widely used variants of plasma etching technology are: Reactive Ion Etching, Inductively Coupled Plasma Etching and Atomic Layer Etching (ALE).

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Plasma Thrusters

Plasma thrusters fall into the category of electric thrusters, and use electric or magnetic fields to accelerate the propellant. A variety of designs to generate and accelerate the plasma can be grouped broadly into Hall thruster, RF (Helicon) thruster and microwave (ECR) thruster.

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RF Measurements

Radio frequency (RF) generators are key components in semiconductor manufacturing units. The measurements about impedance, phase, current and voltages waveform etc. enable process efficiency and repeatability.

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Atmospheric Pressure Plasma

Atmospheric pressure plasmas are used for a wide variety of applications. A major advantage of atmospheric plasmas is that no vacuum equipment is required to create low pressure environments.

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Plasma Sources

The plasma generation environment depends on application requirements and pressure ranges. The fundamental properties of a plasma span a wide range of particle temperatures and densities depending on the source used.

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Materials

Synthesis of novel materials such as transparent conducting oxides (TCOs) and diamond like coatings (DLCs) is the key project of any fabrication lab in today’s semiconductor industry.

Arc Detection

Learn more about arc detection

Langmuir Probe
Plasma Uniformity Measurement

Read more about the Langmuir Spatial

Matchbox Characterization

Learn more about Match Box Characterization

Semion Holders Sensors
Thin Film Process Transfer

Learn more about the Quantum RFEA

Thin Film Deposition

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ALD/ALE
Plasma Etching

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Thrusters
Plasma Thrusters

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RF Measurements

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Atmospheric Plasmas
Atmospheric Pressure Plasma

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Plasma Sources

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Materials

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Intelligent Sensors for RF & Plasma Processing

Impedans provide you with intelligent sensing platforms for radio-frequency (RF) and plasma process monitoring. Our products find applications in fundamental research, process development, tool design, process control and fault detection and classification (FDC). We serve a wide range of industries, due to the ubiquitous nature of RF and plasma processing, such as semiconductor, vacuum coating, medical device, hard disk and aerospace among many others.

What Our Clients Say

“Impedans provides unique products, timely support, and always welcome customer’s feedback to further improve their product. It is a delight to work with Impedans’ development team”   

Samer Bana, Head of Engineering Logic Conductor Etch | Applied Materials, USA  

“Impedans have been superb. Their customer service is great. The guys there respond very quickly”

Dr. Pedro Costa, Pinto Senior Division Member | Technology Department, CERN, Switzerland

“I would recommend Impedans to anyone seeking plasma measurement systems”

Prof Richard van de Sanden, Director | Dutch Institute for Fundamental Energy Research, The Netherlands

“Impedans are a pleasure to work with. They are friendly, accommodating and patient”

Dr. Jean-Francois de Marneffe, Senior Process Engineer | IMEC, Belgium

“The Semion system together with Impedans’ friendly and immediate customer service – an effective team for plasma analysis”

Dr. Thomas Plach, EV Group | Austria

“Impedans provide an excellent product and their customer service is great”

Dr. Cormac Corr, Plasma Research Laboratory | Australian National University, Australia

“Impedans are a pleasure to work with. The excellent customer service makes a real difference to me”

Dr. Mark Bowden, Senior Lecturer in Physics | The Open University, UK

“Impedans provide exciting instruments to measure plasma. I very much look forward to their product updates.”

Dr. Vitezslav Stranak, Institute of Physics | University of Greifswald, Germany
Talk to Us Today

Do you want to learn more about our sensors or applications? Contact us and a member of the team will get back to you