info@impedans.com 
ImpedansImpedansImpedans
Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio in real time.
Our Retarding Field Energy Analyzers are modular and can be quickly and easily installed on chambers with various flange options.
Our software, which can be installed on any PC or laptop, is very intuitive and user friendly.
Our RFEA sensors come with multiple substrate shapes and materials.
All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed.
The Impedans Retarding Field Energy Analyser (RFEA) systems measure the ion flux and ion energy distribution hitting a surface in real-time using an imitation substrate (holder plate) with integrated sensors. The holders can have up to 13 sensing elements distributed around the imitation substrate, which is primarily used to investigate the uniformity of ion energy and ion flux at the substrate in industrial plasma applications. A range of replaceable sensing elements with different signal sensitivities are available to probe a wide range of plasma ion current densities. This is the industry standard for substrate level measurement of the ion energy distribution, used in over 100 publications for fundamental research and plasma process development.
Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio.
Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting.
Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed.
Our software has been designed to be easy to use and can be installed on any laptop or PC.
Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed.
The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area.
The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options.
We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements.
Holders with different shapes and designs available upon request.
Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges.
The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
| Semion | Semion 3KeV | Semion pDC | Quantum | |
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Multi Sensor Holder Option |
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Max RF Bias |
1kV pk-pk * |
3kV pk-pk * |
0V |
900V pk-pk * |
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Max DC Bias |
-1940V |
-1500V |
400V pk-pk |
-1940V |
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Ion Energy |
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Ion Flux |
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Negative Ions |
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Bias Voltage |
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With Multimeter |
With Multimeter |
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Time-resolved Measurements |
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Deposition Rate |
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Aspect Ratio** |
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| Semion | |
|---|---|
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Multi Sensor Holder Option |
Yes |
|
Max RF Bias |
1kV pk-pk * |
|
Max DC Bias |
-1940V |
|
Ion Energy |
Yes |
|
Ion Flux |
Yes |
|
Negative Ions |
Yes |
|
Bias Voltage |
Yes |
|
Time-resolved Measurements |
No |
|
Deposition Rate |
No |
|
Aspect Ratio** |
Yes |
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Read More |
| Semion 3KeV | |
|---|---|
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Multi Sensor Holder Option |
No |
|
Max RF Bias |
3kV pk-pk * |
|
Max DC Bias |
-1500V |
|
Ion Energy |
Yes |
|
Ion Flux |
Yes |
|
Negative Ions |
Yes |
|
Bias Voltage |
With Multimeter |
|
Time-resolved Measurements |
No |
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Deposition Rate |
No |
|
Aspect Ratio** |
Yes |
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Read More |
| Semion pDC | |
|---|---|
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Multi Sensor Holder Option |
No |
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Max RF Bias |
0V |
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Max DC Bias |
400V pk-pk |
|
Ion Energy |
Yes |
|
Ion Flux |
Yes |
|
Negative Ions |
Yes |
|
Bias Voltage |
With Multimeter |
|
Time-resolved Measurements |
Yes |
|
Deposition Rate |
No |
|
Aspect Ratio** |
Yes |
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Read More |
| Quantum | |
|---|---|
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Multi Sensor Holder Option |
No |
|
Max RF Bias |
3kV pk-pk * |
|
Max DC Bias |
-1940V |
|
Ion Energy |
Yes |
|
Ion Flux |
Yes |
|
Negative Ions |
Yes |
|
Bias Voltage |
Yes |
|
Time-resolved Measurements |
No |
|
Deposition Rate |
Yes |
|
Aspect Ratio** |
Yes |
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Read More |
* @13.56MHz, reduces to 0.3kV @ 60MHz
** Using capillary plates
