HiPIMS induced high-purity Ti3AlC2 MAX phase coating at low-temperature of 700 ◦C

Plasma Characteristics of a Novel Coaxial Laser-Plasma Hybrid Welding of Ti Alloy

Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

RF Matching Network Characterization

Matchbox Characterization

Study of SiO2 sputter etch rate in RF-Biased ICP discharge.

Analysis of 13.56 MHz and 40 MHz capacitively coupled nitrogen plasmas

Langmuir probe used in a lunar dust application to measure the electron density and energy distribution

Study of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Ion energy distribution measurements in RF and pulsed DC plasma discharges

Using Impedans Semion RFEA System to measure the effect of gas pressure on Ion Energy in a very-high frequency (VHF) magnetron sputtering discharge.

Investigation of the performances of the microwave plasma source ‘Aura-wave’ by Impedans Langmuir Probe System

In-Orbit Demonstration of Novel Thruster, characterized by Impedans Semion Retarding Field Energy Analyzer

Effect of substrate biasing on the ion properties of a magnetron sputtering system using Impedans’ Semion RFEA System and Octiv Suite 2.0 VI Probe

Design and characterization of a plasma chamber for improved radial and axial film uniformity using Impedans’ Langmuir probe system

Inductively coupled array (INCA) discharge using Impedans’ Semion RFEA System and Octiv VI Probe

Evolution of electronegativity during the E to H transition in RF inductively coupled plasma using Impedans’ Langmuir Probe System

An experimental and analytical study of an asymmetric capacitively coupled plasma used for plasma polymerization using Impedans’ Octiv Suite 2.0 VI probe

Analysis of electron properties of an emissive cathode using Impedans’ Langmuir probe system

Tailored ion energy distributions at an rf-biased plasma electrode using Impedans’ Semion RFEA System

A prospective microwave plasma source for in situ spaceflight applications characterized using Impedans’ Langmuir probe system

CubeSat ion thruster characterization using Impedans’ Semion Pulsed DC retarding field energy analyzer

Characterization of a DC, CO 2-H2 Plasma using Impedans’ Langmuir Probe System

The magnetic asymmetry effect in geometrically asymmetric RF capacitively coupled plasmas, characterized with Impedans’ Octiv Suite 2.0 VI probe and Semion RFEA system

The effect of driving frequency on the IVDF in a magnetron sputtering system using Impedans’ Semion RFEA System

Ion angular distribution measurement with a planar retarding field analyzer

Experimental characterisation of a vacuum arc thruster using Impedans’ Semion Pulsed DC retarding field energy analyzer

Impedans Semion RFEA System is used in Silicon etching in a pulsed HBr/O2 plasma – Ion flux and energy analysis

Experimental investigations on time resolved characteristics of pulsed inductively coupled O2 /Ar plasmas using Impedans Langmuir Probe.

Impedans Langmuir Probe and Octiv Poly are used to study the nonlocal electron kinetics and spatial transport in radio-frequency two-chamber inductively coupled argon discharges

Impedans Langmuir Probe and Octiv Suite are used to study the time dependencies of pulsed inductively coupled Ar and Ar/CF4 discharges

Impedans Langmuir Probe is used to measure the negative ions in an electro-negative plasma

Ion velocity distribution measurement through high-aspect ratio holes using the Semion system

Ion energy and ion flux measurements through high-aspect ratio holes using the Vertex system

Measurement of deposition rates and ion energy distributions using the Quantum System

Determination of ion and neutral deposition rates using a quartz crystal microbalance and a gridded energy analyzer

Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection

Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system

Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA

Investigation of ion ejection from a mini-helicon thruster using a Semion retarding field energy analyzer

Study of the effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Study of form Ti–Cu thin films with regard to controlling the copper release

Continuous-Wave RF Plasma Polymerisation of Furfuryl Methacrylate (FMA)

Investigation of the deposition rate of organophosphate thin films using Octiv VI Probe.

Octiv VI probe used to measure the RF characteristics of a commercial CCP reactor

Study demonstrating a simple radio-frequency (RF) power-coupling scheme for a micro atmospheric pressure plasma jet

Ion flux as an alternative deposition rate parameter

Correlation between plasma parameters and Impedans Octiv VI probe measurements using Regression Analysis

Numerical and Experimental Diagnostics of Dusty Plasma in a Coaxial Gridded Hollow Cathode Discharge

Study of EEPF characteristics of an expanding inductively coupled hydrogen plasma

Investigations of the phase-shift effect in capacitively coupled plasma discharges

Determining the temporal evolution of negative ion density in the afterglow of reactive HiPIMS

Plasma diagnostics of low-pressure high-power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

A study of plasma parameters in a BAI 730 M triode ion plating system by means of a Langmuir probe and plasma mass and energy spectroscopy

Observation of two-temperature electrons in a sputtering magnetron plasma

Hall Effect Thruster plasma plume characterization with probe measurements and self-similar fluid models

End-point detection of polymer etching using Langmuir Probes

Time-resolved plasma characterization of modulated pulsed power magnetron sputtering

RF Dusty Plasma to measure the dust charge and density

Ion energy distributions in bipolar pulsed DC discharges of methane measured at the biased cathode

Ion flux and ion distribution function measurements in synchronously pulsed inductively coupled plasmas

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