Substrate Level

The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution function (IEDF) and the ion-neutral deposition ratio at a surface inside a plasma reactor.

The Vertex Retarding Field Energy Analyser (RFEA) system measures the Ion flux and Ion energy distribution function (IEDF) incident on a surface in real time using an imitation substrate with replaceable, integrated sensors. The Vertex system can also measure these parameters for a range of configurable Aspect Ratios (ARs) ranging from 0.5 to 20, with a resolution of 0.5, to understand their influence on deep trench etching.

The Semion Pulsed DC system is a precision plasma measurement instrument used to measure the time dependence of the ion energy distribution function (IEDF) arriving at a surface in a plasma chamber.

The Semion 3 keV is a Single Sensor that can be placed at any location inside a plasma reactor and measures the energy of ions hitting a surface with an RF Bias of up to 3kV peak-peak.

The Semion Retarding Field Energy Analyser (RFEA) system measures the ion flux and ion energy distribution hitting a surface in real-time using an imitation substrate (holder plate) with integrated sensors.