At Impedans Limited, we help equipment makers in a range of industries to develop and optimize high-performance plasma equipment for processes such as plasma-enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD), reactive ion etching (RIE), deep reactive ion etching (DRIE), plasma cleaning and more. Our sensors and instrumentation can measure critical plasma-related parameters such as ion energy, ion flux, plasma density, electron temperature, RF power, and impedance, allowing equipment makers to improve their processes’ efficiency and reliability. We also assist with plasma surface activation, including plasma nitridation, oxidation, and polymerization. Our cutting-edge technology and expertise in atmospheric pressure plasma treatment, corona discharge treatment, and dielectric barrier discharge treatment enable us to offer a range of solutions that meet our customers’ specific requirements. At Impedans, we are committed to helping equipment makers drive innovation, improve productivity, and meet the highest industry standards in a range of applications, including semiconductor manufacturing, surface treatment, and plasma research.
You can reduce the requirement to run costly metrology processes by monitoring real time data that directly correlates with etch/deposition rates.
Early detection of process end point reduces overprocessing increasing the throughput of your tool.
Our sensors enable predictive maintenance by early detection of faults saving time on unneccesary scheduled maintenance.
Reduce costly down time and increase overall efficiency by detecting and classifying faults using the data provided by our sensors.