Our technology allows for accurate and reliable monitoring of plasma processes, reducing the need for costly and time-consuming metrology checks on wafers. This helps to improve manufacturing processes, increase throughput, and reduce costs.
At Impedans, we use RF sensors to collect data on plasma processes in real-time. This data can be used to directly correlate with the plasma parameters and the performance of the process. By analyzing this data, we can accurately predict the end result of the process without the need for additional metrology checks on wafers. This approach is known as virtual metrology.
Live process monitoring is particularly useful in semiconductor manufacturing, where the quality of the product is critical, and the cost of metrology checks can be high. By using our RF sensors to collect data on plasma processes, we can reduce the need for metrology checks, which in turn increases the throughput of the factory and reduces costs. This results in a more efficient and cost-effective manufacturing process, without compromising the quality of the product.
Our virtual metrology technology is highly accurate and reliable. Our RF sensors collect data on the plasma process in real-time, providing instant feedback to the manufacturing process. This allows for immediate adjustments to be made in the process if needed , ensuring that the quality of the product is maintained at all times.
Best for: Ion flux, spatial resolution, time resolution
Measures: ion density, electron temperature, plasma potential, ion flux
Best for: Ion Energy
Measures: Ion Energy, Ion Flux, Aspect Ratio, Deposition Rate
Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification
Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux