When setting up a new plasma processing tool, it is essential to ensure that the process parameters are correctly transferred from the original tool to the new tool. This process transfer involves replicating the process conditions, such as gas flow rate, pressure, and power, to ensure that the new tool produces the same results as the original tool.
At Impedans Ltd, we provide advanced plasma diagnostics tools that can be used to confirm when a new tool has been set up correctly. Our sensors are designed to provide accurate and reliable measurements of plasma parameters such as plasma density, electron temperature, and plasma potential, which are critical for understanding the behavior and performance of plasma processing tools.
During the process transfer, our sensors can be used to compare the plasma parameters in the original tool and the new tool. By comparing the plasma parameters, users can ensure that the process conditions in the new tool are the same as the original tool, and the new tool is producing the same results as the original tool.
Our sensors are also useful for identifying any discrepancies between the original tool and the new tool. If there are any discrepancies, our sensors can be used to adjust the process conditions in the new tool to match the original tool, ensuring that the new tool produces the same results as the original tool.
In addition to confirming process transfer, our sensors can also be used for process monitoring and control. By providing accurate and reliable measurements of plasma parameters, our sensors enable users to optimize the process conditions, improve process stability, and reduce process variability.
Best for: Ion flux, spatial resolution, time resolution
Measures: ion density, electron temperature, plasma potential, ion flux
Best for: Ion Energy
Measures: Ion Energy, Ion Flux, Aspect Ratio, Deposition Rate
Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification
Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux