Our advanced plasma diagnostics tools can be used for plasma characterization for research and industry over a range of applications. Our sensors are designed to provide accurate and reliable measurements of plasma parameters such as plasma density, electron temperature, and plasma potential, which are critical for understanding the behavior and performance of plasma processing tools.
Characterizing plasma processing tools is one of the main uses of our sensors. Tool characterization is essential for optimizing the performance of the tool, improving product quality, and reducing manufacturing costs.
Our sensors are used to characterize a wide range of plasma processing tools, including but not limitted to plasma etchers, plasma-enhanced chemical vapor deposition (PECVD) tools, and plasma ashers. By accurately measuring the plasma parameters in these tools, our sensors enable users to optimize the tool design to optimize process conditions, improve process stability, and reduce process variability.
In addition to plasma processing tools, our sensors can also be used to characterize plasma in other applications, such as thrusters and space applications. Plasma thrusters are used in spacecraft propulsion, and our sensors can be used to measure the plasma parameters in these thrusters to improve their performance and efficiency. Our sensors can also be used to characterize plasma in space applications, such as in the study of plasma waves and the interaction of plasma with magnetic fields.
Best for: Ion flux, spatial resolution, time resolution
Measures: ion density, electron temperature, plasma potential, ion flux
Best for: Ion Energy
Measures: Ion Energy, Ion Flux, Aspect Ratio, Deposition Rate
Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification
Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux