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Radio Frequency Power: Driving Modern Plasma Technologies

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Application Notes Applications

Octiv VI probe application for surface wettability control and fluorination of amorphous carbon films

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Unlocking Advanced Manufacturing: Plasma-Assisted Deposition Process

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Impedans Langmuir Probe used for the etching process of magnetic tunnel junction materials in random access memory devices

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Understanding Plasma Etching: The key to Next-Gen Semiconductor Devices

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Optimization of plasma polymerization process with the Impedans Octiv VI probe for polymer film depositions

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Mastering Precision: End Point Detection in Semiconductor Manufacturing

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Understanding Plasma Thruster Dynamics and Thrust Assessment Using Impedans Semion RFEA

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Identifying ALE window in plasma etching of SiO2 and Si3N4 with Impedans Octiv VI probe.

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Unveiling Plasma Harmonics: The Fingerprint of Semiconductor Manufacturing

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Impedans Semion provides key ion energy measurements required for the development of Vertical Graphene through PECVD process

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AI’s Vision – VI Probes Shaping the Future of Semiconductor Manufacturing