Categories
Application Notes

Determination of ion and neutral deposition rates using a quartz crystal microbalance and a gridded energy analyzer

Categories
Application Notes Moduli RF Spectrometer Octiv Poly 2.0 Octiv Suite 2.0 Process End Point Detection

Using Plasma Radio-Frequency Harmonic Emission for Clean Endpoint and Small Open Area Etch Endpoint Detection

Categories
Application Notes Model Validation Semion 2500 V4

Ion energy and angular distributions measured in a planar Ar/O2 ICP using the Semion RFEA system

Categories
Application Notes Process Performance Semion 2500 V4 Tool Characterization

Characterization of SiO2 pattern transfer in an ALE process using the Semion RFEA

Categories
Application Notes Semion 2500 V4 Tool Characterization

Investigation of ion ejection from a mini-helicon thruster using a Semion retarding field energy analyzer

Categories
Application Notes Semion 2500 V4 Tool Characterization

Study of the effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering

Categories
Application Notes Process Performance Semion 2500 V4

Study of form Ti–Cu thin films with regard to controlling the copper release

Categories
Application Notes Octiv Suite 2.0

Continuous-Wave RF Plasma Polymerisation of Furfuryl Methacrylate (FMA)

Categories
Application Notes Octiv Poly 2.0

Investigation of the deposition rate of organophosphate thin films using Octiv VI Probe.

Categories
Application Notes Octiv Poly 2.0 virtual metrology

Octiv VI probe used to measure the RF characteristics of a commercial CCP reactor

Categories
Application Notes Octiv Poly 2.0 Tool Characterization

Study demonstrating a simple radio-frequency (RF) power-coupling scheme for a micro atmospheric pressure plasma jet

Categories
Application Notes Octiv Suite 2.0

Ion flux as an alternative deposition rate parameter